ASML offers Laser-Produced Plasma EUV Source
Product
ASML’s laser-produced plasma source generates EUV light for advanced semiconductor lithography.
- Currently Offered
ASML’s laser-produced plasma source generates EUV light for advanced semiconductor lithography.
ASML’s laser-produced plasma source generates 13.5 nm extreme ultraviolet light inside its lithography systems. A generator ejects molten tin droplets, and two laser pulses flatten and vaporize each droplet into a light-emitting plasma. ASML says this process repeats 50,000 times per second to supply light for chip production.
The source is a component integrated into ASML’s NXE and EXE scanners, rather than a complete wafer-patterning machine. Its technology descends from Cymer’s laser-produced plasma sources, which ASML adopted before acquiring Cymer in 2013. Cymer records delivery of a production-ready source in 2009; that date describes the source lineage rather than the launch of a current ASML revision.
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xLight's planned EUV Light Source System uses free-electron lasers for semiconductor lithography.
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Gigaphoton develops compact laser-produced-plasma EUV light sources for semiconductor mask inspection.
TAU's lithography light source uses compact particle accelerators to drive X-ray lasers.
STARLIGHT is Inversion Semiconductor’s planned tunable soft X-ray source for lithography development and related applications.