TAU Systems offers Ultimate Light Source for Semiconductor Lithography
Product
TAU's lithography light source uses compact particle accelerators to drive X-ray lasers.
- Currently Offered
TAU's lithography light source uses compact particle accelerators to drive X-ray lasers.
TAU Systems is developing a lithography light source that combines compact particle accelerators with X-ray lasers. The company intends the system to provide light for printing smaller semiconductor features while fitting within existing fabrication facilities. Its design addresses the light-generation component of lithography rather than supplying a complete wafer-patterning machine.
The light source forms part of TAU's development roadmap alongside radiation testing and compact accelerator applications. The company describes these applications as steps toward manufacturing capacity and a semiconductor lithography market. The offering remains in development, and its proposed capabilities should be distinguished from commercial production or installed fabrication equipment.
xLight's planned EUV Light Source System uses free-electron lasers for semiconductor lithography.
xLight's planned EUV Light Source System uses free-electron lasers for semiconductor lithography.
STARLIGHT is Inversion Semiconductor’s planned tunable soft X-ray source for lithography development and related applications.
ASML's EUV lithography systems use laser-produced plasma technology to enable advanced semiconductor manufacturing.
Gigaphoton develops compact laser-produced-plasma EUV light sources for semiconductor mask inspection.
ASML’s laser-produced plasma source generates EUV light for advanced semiconductor lithography.
STARLIGHT is Inversion Semiconductor’s planned tunable soft X-ray source for lithography development and related applications.
ASML's EUV lithography systems use laser-produced plasma technology to enable advanced semiconductor manufacturing.
Gigaphoton develops compact laser-produced-plasma EUV light sources for semiconductor mask inspection.
ASML’s laser-produced plasma source generates EUV light for advanced semiconductor lithography.